Abstract: | Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MoSi 2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700°C. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R ´ 1/3[0001] and correspond to thin slabs of the equilibrium C11 b phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11 b by a process akin to discontinuous coarsening. |