Kinetics of diffusion via divacancies in a concentrated random fcc alloy |
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Authors: | I.V. Belova G.E. Murch |
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Affiliation: | Physikalisches Institut und BIMF, Universit?t Bayreuth , Postfach 101251, D-8580, Bayreuth, F.R. Germany |
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Abstract: | The diffusion kinetics in a concentrated fcc alloy are described by means of divacancies. The model chosen is the random alloy model with bound divacancies. We show that for the fcc structure the Manning formalism developed originally for monovacancies can be used intact to describe diffusion via divacancies. Monte Carlo simulation results for both tracer and collective correlation factors are in good agreement with the results of the formalism for a wide range of the component atom exchange frequencies with the divacancy except for the slower-moving component. |
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Keywords: | Cd(OH)2 CdO thin films band gap chemical bath deposition nanoparticles |
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