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Kinetics of diffusion via divacancies in a concentrated random fcc alloy
Authors:I.V. Belova  G.E. Murch
Affiliation:Physikalisches Institut und BIMF, Universit?t Bayreuth , Postfach 101251, D-8580, Bayreuth, F.R. Germany
Abstract:

The diffusion kinetics in a concentrated fcc alloy are described by means of divacancies. The model chosen is the random alloy model with bound divacancies. We show that for the fcc structure the Manning formalism developed originally for monovacancies can be used intact to describe diffusion via divacancies. Monte Carlo simulation results for both tracer and collective correlation factors are in good agreement with the results of the formalism for a wide range of the component atom exchange frequencies with the divacancy except for the slower-moving component.
Keywords:Cd(OH)2  CdO  thin films  band gap  chemical bath deposition  nanoparticles
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