A novel method for measurement of electronic work function of micro/nanostructure materials using a Kelvin probe system |
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| Authors: | W Li CW Wu LM Ke CG Yang P Wei SF Zhu |
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| Institution: | 1. School of Materials Science and Engineering, Nanchang Hangkong University , Nanchang, 330063, P.R. China wl@yahoo.com;3. School of Materials Science and Engineering, Nanchang Hangkong University , Nanchang, 330063, P.R. China |
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| Abstract: | Work function (WF) can be measured using the Kelvin probe (KP) technique to characterize surface behavior of micro/nanostructures grown on substrates such as metals or semiconductors. However, for such micro/nanostructures, substrates with different WF can strongly affect the measurements if they are exposed directly to face the Kevin probe tip. In this article, a model is proposed to investigate the WF of sparse ZnO nanorods grown on an Si substrate. It is demonstrated that theoretical results from the model are consistent with experimental observations performed using a KP system. |
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| Keywords: | Kelvin probe micro/nanostructure work function ZnO nanorods electronic nanoceramics |
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