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Unexpected nanoscale phase separation in sputterdeposited Ni-25 at.%Al thin films
Authors:R. Banerjee  G.B. Thompson  G.B. Viswanathan  H.L. Fraser
Abstract:

Thin films of nominal composition Ni-25at.%Al, sputter deposited from a target of the intermetallic compound Ni 3 Al on unheated substrates, exhibit an unexpected phase separation, in contrast with other intermetallic-forming systems such as Ti-Al which are deposited as compositionally homogeneous amorphous films under similar conditions. Precipitates of a novel tetragonal phase, a few nanometres in size, were formed in the matrix consisting of a fcc Ni-rich Ni(Al) phase and a hcp Ni-rich Ni(Al) phase. Ni-Al films of the same composition deposited on heated substrates exhibited the formation of a single, chemically long-range-ordered Ni 3 Al phase with the L1 2 structure, the thermodynamically stable phase for this composition.
Keywords:
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