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The effect of hydrogen plasma on the properties of a-Si:H/a-Si1-xNx:H superlattices |
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| Authors: | M. Yamaguchi K. Yatabe H. Ohta K. Morigaki |
| Affiliation: | 1. The Institute for Solid State Physics, The University of Tokyo , Roppongi, Minato-ku, Tokyo, 106, Japan;2. The Institute for Solid State Physics, The University of Tokyo , Roppongi, Minato-ku, Tokyo, 106, Japan;3. Tokyo National College of Technology , Hachiohji, Tokyo, 192, Japan |
| Abstract: | Abstract A hydrogen plasma introduced during the interrupting interval when alternating two gases affects the properties of a-Si:H/a-Si1-xNx:H superlattices resulting in the creation of fewer interface defects than the superlattices prepared without the hydrogen plasma. |
| Keywords: | chalcogenide microlenses femtosecond laser processing amorphous As2S3 photoexpansion ray tracing |