Epitaxial Ni-Al thin films on NaCl using a Ag buffer layer

Epitaxial nanoscale [001] films of Ni _x Al_100-x (x = 62.5) have been prepared by physical vapour deposition on to a thin film of Ag [001] on NaCl (001) faces with occasional hillocks. The Ag film contains numerous dislocations and stacking faults and has a rms surface roughness of 2 nm. The Ni-Al film is ordered in the B2 structure and reveals many dislocations as well as antiphase boundaries between ordered domains. The formation of subgrains in the Ni-Al film results in severe height variations up to 30 nm across the surface. A cross-sectional model for the growth of both films is presented.