The locus of masking shape-at-a-slant

Twelve subjects provided shape and orientation judgments for a set of projectively equivalent, variously rotated rectangles under three viewing conditions—monoptic, dichoptic, and binocular—with and without the presence of a pattern mask. In the absence of the mask, partial constancy was exhibited under the first two conditions and near perfect constancy under the binocular condition. Orientation was discriminated. Presence of the mask produced projective shape matching and diminished orientation discrimination. It is argued that the site of masking was postchiasmal, and the results are related to previous work with pattern masking of projectively equivalent ellipses.