The chemical potential and the work function of a metal film on a dielectric substrate |
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| Authors: | P. P. Kostrobij |
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| Affiliation: | Department of Applied Mathematics, Lviv Polytechnic National University, Lviv, Ukraine |
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| Abstract: | The chemical potential and the work function of an aluminium metal film which is in the vacuum (1) and on a dielectric substrate (2) are obtained using the model of non-interacting electrons confined by an asymmetric rectangular potential well. For the first time, these two characteristics are calculated with correct taking into account the electroneutrality condition. As a result, the values of the chemical potential and the work function tend to their bulk values upon increasing the film thickness. The presence of a dielectric substrate leads to a small shift in the values of these characteristics. |
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| Keywords: | Quantum size effect metal film chemical potential work function dielectric substrate jellium model |
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